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WO3 thin film photocatalytic properties
Abstract
People with a special method in semiconductor material surface preparation a layer of film materials￡?it is completely different physicality to semiconductor material. Film materials because of its optical properties, electrical properties, magnetic properties, chemical and mechanical properties, thermal properties, such as various characteristics in many areas to be applications such as electrical film, optical thin film, hard film, corrosion resistant film, lubricant, decorative membrane, packaging film, etc.
Light under the condition of catalysts in the illumination can produce strong oxidizing free radicals, this free radicals can thoroughly degraded almost all of the organic matter, and ultimately generate H2O, CO2 and other inorganic of small molecules, plus photocatalytic reaction also has mild reaction condition, reaction, the equipment is simple, secondary pollution small, operation easy control, catalytic materials, low cost and easy operation with the sun light is for reaction etc. Research shows that WO3 photocatalytic good stability, light catalytic degradation water pollutants have ideal catalytic effect, and China's tungsten rich, ranking the first, have extensive WO3 source.
This experiment used tungsten powder together peroxide based sol prepared tungsten acid legal system adopted in sol, add and non-increase oxalic acid contrast research its effect, affecting the WO3 film light catalytic properties, study the main factors of the WO3 film into the membranous, surface morphology, photocatalytic performance influence. The study found that the added after oxalate sol-gel thin WO3 photocatalytic degradation rate performance is better, has also improved. Research by photocatalytic experiments were optimized macerate tiras craft, pulse electrophoresis deposition process and dc WO3 thin film deposition process parameters on the effect of light catalytic properties, find out the main factors of influence film properties respectively, sedimentary processes, comparison and analysis of the dc tilak process and pulse electrophoresis impregnation sedimentary processes, research the three film of photocatalytic WO3 film way properties. Research proof in three process after the WO3 add oxalate preparation of film photocatalytic degradation rate, performance is better than non-increase oxalic acid have also increased, eventually get three process add or non-increase among both sedimentary fabrication processes of oxalic acid, dc WO3 film the best performance of the photocatalytic degradation rates, LuoDanMing B also reached the highest.

Keywords: WO3Film, Photocatalytic, Dip-coating technique, pulsed electrophoretic deposition process, DC current process, peroxide Decatungstate

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Abstract II
μú1?? D÷?? 1
1.1 òy?? 1
1.2 1a′??ˉ?á?°·?àà 2
1.2.1 3￡??1a′??ˉ?á 2
1.2.2 ?é?×1a′??ˉ?á 3
1.3 1a′??ˉ?úàí 3
1.4 1a′??ˉ??ê?μ?ó|ó? 4
1.4.1 ·???′|àí 4
1.4.2 ???????ˉ 4
1.4.3 3??×??D? 4
1.5 ???ˉ?ù 5
1.5.1 WO3μ??§??ì??÷ 5
1.5.2 WO3±??¤μ???àí?ˉ?§D??ê 6
1.6 WO3±??¤μ???±?·?·¨ 6
1.6.1 μ??ˉ?§3á?y·¨ 6
1.6.2 èü?o-?y?o·¨ 7
1.6.3 ?|é?·¨ 9
1.6.4 èè??·￠·¨ 9
1.6.5 à?×ó????ê? 9
1.6.6 ??3?μ?3á?y 10
1.7 ±???ìaμ??D????μ?oí?úèY 10
μú2?? êμ?é·?·¨ 11
2.1 ?÷òaêμ?éê??á?°ò??÷ 11
2.2 ±??¤μ???±? 12
2.2.1 3?μ×μ??°′|àí 12
2.2.2 èü?oμ????? 12
2.3 èü?o3é?¤ 13
2.3.1 ?t×?ìáà-3é?¤ 13
2.3.2 ??3?μ?3á?y3é?¤ 1..