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單晶爐熱場(chǎng)溫度監(jiān)控系統(tǒng)設(shè)計(jì).doc

  
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單晶爐熱場(chǎng)溫度監(jiān)控系統(tǒng)設(shè)計(jì),design of temperature control system for thermal field of single crystal furnace23800字 48頁摘要單晶爐是以直拉法從熔化的多晶硅熔液中生長(zhǎng)硅單晶的電子專用設(shè)備。而等徑控制是單晶爐自動(dòng)控制的核心。單晶直徑在生長(zhǎng)...
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單晶爐熱場(chǎng)溫度監(jiān)控系統(tǒng)設(shè)計(jì)
Design of temperature control system for thermal field of single crystal furnace

23800字 48頁

摘 要
單晶爐是以直拉法從熔化的多晶硅熔液中生長(zhǎng)硅單晶的電子專用設(shè)備。而等徑控制是單晶爐自動(dòng)控制的核心。單晶直徑在生長(zhǎng)過程中可受到溫度、提拉速度與轉(zhuǎn)速、坩堝跟蹤速度與轉(zhuǎn)速、保護(hù)氣體的流速與溫度等因素的影響。在忽略一些干擾因素影響情況下,單晶等徑生長(zhǎng)主要受溫度和拉速影響。因此,爐內(nèi)熱場(chǎng)和生長(zhǎng)速度的精確控制是單晶等徑控制的重點(diǎn),由于這種控制系統(tǒng)是一個(gè)緩慢時(shí)變,并且具干擾嚴(yán)重的非最小相位系統(tǒng)。
介紹了論文的研究背景以及國(guó)內(nèi)外在直拉單晶爐研究現(xiàn)狀及發(fā)展,并對(duì)熱場(chǎng)及其控制以及CZ150直拉單晶爐進(jìn)行了介紹,并由此引出了論文的研究?jī)?nèi)容和方法。主要研究晶體的熱動(dòng)力、熱傳輸,在此基礎(chǔ)上對(duì)熱場(chǎng)建模。敘述了直拉單晶爐熱場(chǎng)模糊變系數(shù)PID溫度控制,首先對(duì)直拉單晶爐熱場(chǎng)的特性進(jìn)行測(cè)試研究,然后用模糊變系數(shù)PID控制算法進(jìn)行控制,用經(jīng)驗(yàn)知識(shí)對(duì)模糊變系數(shù)PID算法中的參數(shù)進(jìn)行修正,達(dá)到理想的控制效果。基于PLC的模塊化直拉單晶爐熱場(chǎng)溫度控制系統(tǒng)的硬件實(shí)現(xiàn),首先提出了直拉單晶爐熱場(chǎng)對(duì)控制系統(tǒng)的硬件要求,然后對(duì)本系統(tǒng)的硬件設(shè)計(jì)進(jìn)行了詳細(xì)說明。基于PLC的模塊化直拉單晶爐熱場(chǎng)溫度控制系統(tǒng)的軟件實(shí)現(xiàn),首先對(duì)軟件系統(tǒng)的整體框架進(jìn)行了介紹,然后對(duì)軟件系統(tǒng)的各個(gè)程序模塊逐個(gè)分析。
關(guān)鍵詞:模塊化,單晶爐,PLC,熱場(chǎng)溫度,控制策略,模糊變系數(shù)PID。

ABSTRACT
Single crystal furnace is a special electronic equipment growth of single crystal silicon polysilicon from the molten in the Czochralski method. While the diameter control is the core of the automatic control of the single crystal furnace. The diameter of a single crystal can affect the velocity and temperature and other factors are influenced by temperature, pulling speed and speed, tracking speed and speed, the crucible of the shielding gas during growth. Ignoring some interference factors case, single crystal diameter growth was mainly controlled by temperature and the effect of casting speed. Therefore, precise control of furnace thermal field and growth rate of crystal diameter control is key, because of this control system is a slowly time-varying, non minimum phase system with disturbance and severe.
These is divided into seven chapters :
The first chapter introduces the research background and research abroad in Silicon crystal furnace status and development , and its control and thermal field CZ150 Silicon crystal furnace were introduced, and thus leads to the contents of the thesis papers and methods.The second chapter of the work is mainly to study the thermal power crystals , heat transfer , on the basis of the modeling of the thermal field .The third chapter details the Silicon crystal furnace hot zone fuzzy PID temperature control with variable coefficients , first Silicon crystal furnace for testing the characteristics of thermal field research , and then use the fuzzy variable coefficient PID control algorithm to control the use of empirical knowledge PID fuzzy variable coefficient correction algorithm parameters to achieve the desired control effect.The fourth chapter details the modular PLC based hardware Silicon crystal furnace hot zone temperature control system implementation, first proposed the Silicon crystal furnace thermal field of the control system hardware requirements , then the system's hardware design detail.The fifth chapter details the PLC based modular Silicon crystal furnace hot zone temperature control system software , the first software system for the overall framework were introduced, and then individually analyzed for each program module software system.Chapter VI summarizes the contents of this thesis , and the subject of further research is needed to improve the focus for a certain amount of discussion, analysis and outlook .
Keywords : modular , single crystal furnace , PLC, thermal field temperature control strategy , fuzzy variable coefficient PID.

目 錄
摘 要 1
第一章 緒論 6
1.1課題提出背景及單晶爐簡(jiǎn)介 6
1.1.1 課題提出背景 6
1.1.2硅單晶直拉法制備簡(jiǎn)介 6
1.1.3直拉單晶爐結(jié)構(gòu)簡(jiǎn)介 7
1.1.4直拉單晶爐的發(fā)展概述 8
1.2國(guó)內(nèi)外研究現(xiàn)狀 9
1.3研究?jī)?nèi)容 11
第二章 直拉單晶爐控制系統(tǒng) 12
2.1直拉單晶爐控制系統(tǒng) 12
2.2直拉單晶爐熱場(chǎng)及其影響因素 13
2.2.1直拉單晶爐熱系統(tǒng)和熱場(chǎng) 13
2.2.2影響熱場(chǎng)溫度梯度的因素 14
2.3直拉單晶爐熱場(chǎng)控制系統(tǒng)總體 15
2.3.1直拉單晶爐熱場(chǎng)控制系統(tǒng) 15
2.3.2直拉單晶爐熱場(chǎng)溫度控制方式 16
2.3.3熱場(chǎng)溫度控制算法 17
2.4本章小結(jié) 18
第三章 直拉單晶爐熱場(chǎng)模糊變系數(shù)PID溫度控制算法研究 19
3.1直拉單晶爐熱場(chǎng)模糊變系數(shù)PID溫度控制 19
3.1.1模糊控制原理 19
3.1.2模糊控制器各部分實(shí)現(xiàn)方法 20
3.1.3模糊控制器的設(shè)計(jì) 21
3.2模糊變系數(shù)PID原理 23
3.2.1模糊變系數(shù)PID參數(shù)整定思想 25
3.3本章小結(jié) 27
第四章 基于PLC直拉單晶爐熱場(chǎng)控制系統(tǒng)硬件實(shí)現(xiàn) 28
4.1熱場(chǎng)控制系統(tǒng)主要功能及硬件要求 28
4.1.1選擇和采購(gòu)溫度傳感器 28
4.1.2熱場(chǎng)控制系統(tǒng)主要功能 29
4.1.3熱場(chǎng)控制系統(tǒng)的硬件要求 29
4.2熱場(chǎng)控制系統(tǒng)的硬件設(shè)計(jì) 31
4.2.1熱場(chǎng)控制系統(tǒng)設(shè)計(jì)原理 31
4.2.2加熱器接口 31
4.2.3直拉單晶爐熱場(chǎng)控制系統(tǒng)功能模塊 32
4.3本章小結(jié) 37
第五章 基于PLC直拉單晶爐熱場(chǎng)溫度控制..